卷对卷式柔性LB膜分析仪-物性测试仪器-仪器设备-生物在线
卷对卷式柔性LB膜分析仪

卷对卷式柔性LB膜分析仪

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产品名称： 卷对卷式柔性LB膜分析仪

英文名称：

产品编号： LT-310

产品价格： 0

产品产地： 中国

品牌商标： MT

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使用范围： null

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卷对卷式柔性LB膜分析仪仪器是一种多功能的LB莫分析仪，具有柔性镀膜，刚性镀膜，垂直镀膜，水平镀膜功能。

卷对卷式柔性LB膜分析仪仪器用于在较长的柔性基底（如保鲜膜式柔性带状基底）上连续沉积单分子薄膜，也可把大尺寸刚性衬底粘接在皮带上进行镀膜，可进行无限多次LB薄膜沉积，可控制柔性基底顺时针或逆时针旋转，沉积X,Y,Z多种类型的LB薄膜结构。同时具备垂直镀膜与水平镀膜功能。衬底可以是卷式铝箔、卷式PET塑料薄膜等。设备包含镀膜槽，卷对卷样品传动装置，卷对卷转动滑障与水平移动滑障，表面压探头与镀膜头，自动进样装置：注射泵与蠕动泵，控制器，电脑。
     卷对卷式柔性LB膜分析仪液体界面单分子薄膜镀膜仪器可进行无限多次薄膜沉积，可控制柔性基底顺时针或逆时针旋转，沉积x、y、z型结构的薄膜。


卷对卷式柔性LB膜分析仪技术指标：


柔性基底镀膜尺寸范围：长度可达3m，宽度可达16.5cm

柔性基底传送速度范围： 0.4625-117 mm/s，调整步阶0.007725 mm/s。

镀膜井尺寸：200x180x200 mm (w-d-h)。刚性基底尺寸。

侵入液体的基片尺寸：不小于170x170x170 mm (w-d-h)，兼容常规片状固体基片。

刚性基底面积：不小于170x170mm。

表面压传感器：带2个表面压传感器，分别测量镀膜区域与补样区域的表面压值，表面压传感器灵敏度：0.01 mN/m，测量范围：0-80 mN/m。


卷对卷式LB膜分析仪LangmuirBlodgett trough LT-310 is experimental research apparatus intended for deposition of mono- and multimolecular films according to the LangmuirBlodgett (LB) and similar techniques. It is also suitable for deposition of thin layers of various nature on solid substrates. Additional units and accessories enable the monomolecular layer deposition for versatile substrate types: a winding unit realizes deposition of LB layers onto flexible substrates (tape) and onto flat rigid substrates attached to the winded tape; rig for horizontal precipitation allows to deposit monomolecular layers onto submerged substrate according to Langmuir-Schaefer (horizontal precipitation, HP) technique by the liquid level lowering (draining).

卷对卷式LB膜分析仪LT-310 can be applied for

  • application      of monomolecular films on solid samples according to the Langmuir-Blodgett      (LB) technique or to the horizontal precipitation (HP) technique

  • deposition      of multimolecular films using corresponding layer-by-layer technique

  • formation      of mono- and multimolecular composite coatings on solid surfaces

  • modification      of the surface properties (hydrophilic behavior, optical, electrical      properties etc. )

  • fundamental      research in ultrathin film fabrication and their use as insulating and      protective coatings, molecular electronic elements, in biology for      creation of bilayer lipid membranes etc.

FEATURES


卷对卷式LB膜分析仪技术参数：

Number of barriers:

One

Full free surface area:

855 cm2

Maximum free surface area confined with the barrier:

815 cm2

Compressed (effective) area:

620 cm2

Liquid medium volume:

9600-10900 cm3

Dipping well:

not smaller than 250x180x200 mm (w-d-h)

Maximum dimensions of the immersed substrate:

170x170x170 mm (w-d-h)

Travel range of the movable horizontal barrier:

350 mm

Velocity range of the barrier motion:

- single side compression 0.01 to 50 mm/min

Dipper mechanism stroke:

86 mm (vertical position of the unit can be adjusted   manually)

Dipper mechanism velocity range:

0.0140 mm/min,

Step of the dipper mechanism velocity change:

0.1 mm/min

Possibility of altering different monomolecular   layers deposition:

Available

Delay between the layers deposition:

0100000 s

Surface tension sensor:

based on Wilhelmy plate 15x15 mm (vertical position   of the sensor can be adjusted manually)

Working range of the surface tension sensor:

0-80 mN/m (stepped and fine adjustment of the range   are available)

Sensitivity of the surface tension sensor:

0.05 mN/m

Number of surface tension sensors:

One / Two (two sensors my be used by default)

Doser for substance feed to   aqueous surface:

- syringe pump: with substance reserve 1 ml   (syringes of up to 10 ml applicable), motion range of leading rod 65 mm
  - peristaltic pump with flow rate about 0.157 ml per one revolution of motor

Overall dimensions:

Trough without mounted rig not bigger than   490x280x260 mm (w-d-h); 
  Maximum size with installed accessories 660x340x500 mm (w-d-h);
  Control unit 200x293x80 mm (w-d-h); 
  Total weight (with all accessories and control unit) 21 kg

Supply voltage:

240 V / 2.3 A / 50 Hz

Control voltage supplied from control unit to   elements of the trough:

+5 V; -5 V; +15 V

Power consumption:

Average 100 W, peak not more than 500 W (without   host PC)

Additional accessories:

  • Substrate clamping        holder for fixing a flat sample on the dipper lever.

  • Rig for film        application by the horizontal precipitation method (by liquid medium        draining)*.

  • A mountable unit for        tape substrate winding with set of guides.

  • A syringe pump doser or        peristaltic pump to feed substance film on liquid interface.

  • Rotating barrier for        substance film transfer into the deposition zone.

  • One draining nozzle at        bottom of the dipping well and 3 additional nozzles in shallow area, all        nozzles for connecting tube of 5 mm inner diameter.

TECHNIQUES


卷对卷式LB膜分析仪技术：

 Deposition of X-type LB film

 Deposition of Y-type LB film

Deposition of Z-type LB film

Horizontal   precipitation (HP) method (by liquid medium draining) provides surface   modification by extremely uniform and homogenous monolayer films (see, for   examplethis paper). HP method allows transferring of monolayer films at various surfaces simultaneously from huge variety of surfactants (both in solid and liquid state) despite of polar head structure. The process of deposition is simple   and fast. In particular, the surface of metallized silicon wafer can be   modified by HP method within 3-5 minutes.

Roll-To-Roll deposition technique engages   additional accessories in the set of LB trough LT-310 to deposit   monomolecular film on tape (continuous deposition on flexible substrate). In   LT-310, extraction angle of the exiting portion of tape may be adjusted in   range 30-90owith step 5o


实验数据：

1. SEM images of the monolayer of silica spheres D1 = 250 nm (a, b) and D2 = 550 nm (c−f) deposited on the PET film using the roll-to-roll LB method. * from M. Parchine, J. McGrath, M. Bardosova, M. E. Pemble,Large Area 2D and 3D Colloidal Photonic Crystals Fabricated by a Roll-to-Roll Langmuir–Blodgett Method, Langmuir,32, 5862 (2016)

2、AFM-images of bi-componentLB-film ofPMMA/DPPC on PETP-tape

(Roll-to-roll technique, p=30 mN/m)，(a) topographic mode, (b) friction mode

* By Dr. G.K. Zhavnerko etc.